An SOC 2 Type II-compliant, AI super intelligence platform for innovation and IP: From instant prior-art searches and AI-assisted ideation to drafting high-quality patents and monetizing innovation!
An SOC 2 Type II-compliant, AI super intelligence platform for innovation and IP: From instant prior-art searches and AI-assisted ideation to drafting high-quality patents and monetizing innovation!

EUV Lithography

A next-generation lithography technology using a range of extreme ultraviolet (EUV) wavelengths. Recently technological updates in EUV Lithography include Multiple patterning, Atomic Layer Deposition (ALD), and Pellicle and Dubbed High NA which enhances the quality and resolves all the background problems. Major market players like canon, ASML, Samsung, Intel, and many others are already working on EUV Lithography.

This Interactive dashboard will provide you with an analysis of “EUV Lithogrpahy” technology by automatically classifying patents using the taxonomy bot (Ontologier).

Register Now! Access the interactive dashboard to get more insights:

  • Problems that companies are trying to solve
  • Explainable AI technology-based multi-level taxonomy segmentation 
  • Evolution of the technology
  • Major technologies emerged in the last few years
  • Top organizations innovating in a field and their research focus
  • New entrants or start-ups in the last few years
  • Innovation hubs or top filing jurisdictions
  • And much more.

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